Unique Sputter Deposition
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1 or 2-inch sample size PVD deposition
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More flexible, cheaper, faster research
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Combinatorial Co-sputter is more efficient for material screening
Three-gun PVD Specifications
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Substrates up to one or two-inch diameter, thickness 0.1mm to 60 mm
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3 independent sputtering guns (2.5 in)
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Background vacuum 1.5 x10-7 Torr
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Independent Pulsed DC
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Uniformity 5% (max-min), 1 sigma 3.7% for 2mm edge exclusion in a one inch sample


Friendly operation interface
Automatic run with programmed recipes
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Sequential for multiple-layer stacks
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Co-sputtering for any layer
Experimental data can be monitored/recorded
