Unique Sputter Deposition

  • 1 or 2-inch sample size PVD deposition
  • More flexible, cheaper, faster research
  • Combinatorial Co-sputter is more efficient for material screening

Three-gun PVD Specifications

  • Substrates up to one or two-inch diameter, thickness 0.1mm to 60 mm

  • 3 independent sputtering guns (2.5 in)

  • Background vacuum 1.5 x10-7 Torr

  • Independent Pulsed DC

  • Uniformity 5% (max-min), 1 sigma 3.7% for 2mm edge exclusion in a one inch sample

Friendly operation interface

Automatic run with programmed recipes

  • Sequential for multiple-layer stacks

  • Co-sputtering for any layer

Experimental data can be monitored/recorded

Sputtering voltage monitoring graph