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Sputter Deposition & Coating service

  • World-class facility & expertise

  • Faster, cheaper, more flexible research

  • Combinatorial co-sputter for more efficient material screening

Three-gun PVD Specifications​

PVD deposition
two 1/2 gun

  • Substrates up to one or two-inch diameter, thickness 0.1mm to 60 mm

  • 3 independent sputtering guns (2.5 in)

  • Background vacuum 1 x10-7 Torr

  • Independent Pulsed DC

  • Uniformity 5% (max-min), 1 sigma 3.7% for 2mm edge exclusion in a one inch sample

New Material Research Capability

  • Metals

  • Alloys

  • Metal nitrides

  • Metal oxides

Fast Prototyping with Rapid R&D Cycles

  • More flexible, cheaper, faster research by small sample size

  • Example case studies completed within two weeks

Research cycle

Our clients consistently praise the precision and professionalism of our reports and services, with nearly 100% satisfaction.

Research report
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