Unique Sputter Deposition
-
1 or 2-inch sample size PVD deposition
-
More flexible, cheaper, faster research
-
Combinatorial Co-sputter is more efficient for material screening
Three-gun PVD Specifications
-
Substrates up to one or two-inch diameter, thickness 0.1mm to 60 mm
-
3 independent sputtering guns (2.5 in)
-
Background vacuum 1.5 x10-7 Torr
-
Independent Pulsed DC
-
Uniformity 5% (max-min), 1 sigma 3.7% for 2mm edge exclusion in a one inch sample
Friendly operation interface
Automatic run with programmed recipes
-
Sequential for multiple-layer stacks
-
Co-sputtering for any layer
Experimental data can be monitored/recorded
