top of page

Sputter Deposition & Coating service

  • World-class facility & expertise

  • Faster, cheaper, more flexible research

  • Combinatorial co-sputter for more efficient material screening

Three-gun PVD Specifications​

PVD deposition
two 1/2 gun

  • Substrate sizes: up to 1", 2", or 3" diameter, thickness from 0.1mm to 60 mm

  • Equipped with 3 independent 2.5" sputtering guns

  • Background vacuum 1 x10-7 Torr

  • Independent pulsed DC power supplies for precise control

  • Film uniformity: ≤5% (max–min); 1σ = 3.7% with 2 mm edge exclusion on a 1" sample

New Material Research Capability

  • Metals

  • Alloys

  • Metal nitrides

  • Metal oxides

Fast Prototyping with Rapid R&D Cycles

  • More flexible, cheaper, faster research by small sample size

  • Example case studies completed within two weeks

Research cycle

Our clients consistently praise the precision and professionalism of our reports and services, with nearly 100% satisfaction.

Research report
bottom of page