JOURNAL PAPERS, CHAPTER IN BOOKS AND CONFERENCE PRESENTATIONS:
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G. Ding, C. Clavero, “Silver-Based Low-Emissivity Coating Technology for Energy-Saving Window Applications” chapter in the book “Modern Technologies for Creating the Thin-film Systems and Coatings” 2017 March. publisher: Intech. chapter 20.
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G. Ding, C. Clavero, D. Schweigert, M. Le, “Thickness and microstructure effects in the optical and electrical properties of silver thin films” American Institute of Physics ADVANCES, Volume: 5 Issue: 11 Article Number: 117234, NOV 2015
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Guowen Ding, Wei-Te Wu, Steve Mak, and Wai-Fan Yau, “Quick estimation of physical etching of SiO2 among etchers with decoupled plasma sources”, Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 21, 577 (2003)
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K. L. Kelly, J. E. Scharer, E. S. Paller, and G. Ding. "Laser Ionization and Radiofrequency Sustainment of High-Pressure Seeded Plasmas." Journal of Applied Physics, 92 (698-708), July 2002
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E. S. Paller, J. E. Scharer, K. Akhtar, K. Kelly, G. Ding. "Radiofrequency Initiation and Radiofrequency Sustainment of Laser Initiated Seeded High Pressure Plasmas." Radio Frequency Power in Plasmas, (526-529), 2001
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G. Ding, J. Scharer, and K. Kelly, “Effects of rapidly decaying plasmas on Electric probe measurements,” Journal of Applied Physics, 84(3) (1998) 1236.
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K. Kelly, J. Scharer, G. Ding and M. Bettenhausen, “Microwave Reflections from a Vacuum Ultra-Violet Laser Produced Plasma Sheet,” Journal of Applied Physics 85(1) (1999) 63.
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G. Ding, W. Sun et al. “Effects of Reagent Orbital Alignment on Product Vibrational Distributions of the Chemiluminescent Reaction Ca(1P1) +CH3I,” Chemical Physics Letters 265 (1997) 392.
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W. Yang, G. Ding et al. “Product rotational alignment of Orbital Aligned Ca(1P1) with CnH2n+1Br (n=1,2,3) Reactions,” Progress in Natural Science 6 (1996) 293.
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W. Yang, G. Ding, et al. “The Chemiluminescent Studies of the Orbital Aligned Ca(1P1) with CH4-nCln (n=1,2,3,4) Reactions,” Chemical Physics 193 (1995) 345.
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G. Ding, W. Yang et al. “The Product Polarization of Chemiluminescent Reactions of Orbital Aligned Ca(1P1) with CH3I and C2H3I,” Chemical Physics Letters 220 (1994) 1.
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W. Yang, G. Ding, et al. “The Studies of laser excited Ca(1P1) with chloromethane series,” Science in China, 25(4) (1995) 358.
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G. Ding, W. Sun et al “Reagent Orbital Alignment Effect in Chemiluminescence Reactions Ca(1P1) + CH3X (X=Cl, I),” Molecular Physics. 96(9) (1999) 1349
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J. Scharer, G. Ding et al. “Laser and radio-frequency production of seeded air plasmas,” American Institute of Aeronautics and Astronautics Paper 99-3668, (1999)
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V. J. Tu, J. Y. Jeong, A. Schutze, S. E. Babayan, G. S. Selwyn, G. Ding and R. F. Hicks, “Tantalum etching with a non-thermal atmospheric-pressure plasma”, Journal of Vacuum Science and Technology A, volume 18(6), (2000) page 2799
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J. Jeong, J. Park, I. Henins, S. E. Babayan, V. J. Tu, G. S. Selwyn, G. Ding and R. F. Hicks, “Reaction Chemistry in the Afterglow of an Oxygen-Helium, Atmospheric-Pressure Plasma”, Journal of Physical chemistry, volume 104, (2000), page 8027
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G. Ding, J. Scharer and K. Kelly, “Diagnostics and Analyses of Decay Process in Laser Produced tetrakis(dimethy-amino)ethylene Plasma”, Plasma of Physics volume 8(1), (2001), page 334.
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S. E. Babayan, G. Ding and R. F. Hicks, “ Determining Nitrogen Atom Density In The Afterglow Of An Nitrogen Atmospheric-Pressure Plasma”, Plasma Chemistry And Plasma Processing, December 2001, Volume 21, Issue 4, pp 505–521
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S. E. Babayan, G. Ding, G. Nowling, X. Yang and R. F. Hicks, “Characterization of the Active Species in the Afterglow of a Nitrogen and Helium Atmospheric Pressure Plasma”, Plasma Chemistry And Plasma Processing, June 2002, Volume 22, Issue 2, pp 255–269
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J. Scharer, K. Kelly, G. Ding, et al., “VUV laser plasma formation and microwave agile mirror/absorber,” IEEE International Conference on Plasma Science, (1996), page 188.
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K. Kelly, J. Scharer, G. Ding, et al. “Microwave reflections from a VUV laser produced plasma sheet”, IEEE International Conference on Plasma Science, (1996), page 261.
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G. Ding, D. Xu and G. He, “Effect of the atomic orbital alignment on the chemiluminescent reactions Ca(1P1) with CH3X (X=Cl, I),” 213th ACS National Meeting, San Francisco, 1997, Abstracts of papers of the American Chemical Society, V213, page 450.
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K. Kelly, J. Scharer, G. Ding, et al. “Microwave Reflections from a VUV Laser produced Plasma Sheet”, American Physics Society, Division of Plasma Physics Meeting, Pittsburgh, (1996), 9Q.29.
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J. Scharer, K. Kelly, G. Ding, M. Bettenhausen, “VUV laser plasma formation and microwave agile mirror/absorber”, IEEE International Conference on Plasma Science, (1997), page 156.
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G. Ding, J. Scharer and K. Kelly, “Dynamics of a laser produced plasma and its properties for microwave reflection”, IEEE International Conference on Plasma Science, (1997), page133.
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K. Kelly, J. Scharer, G. Ding and M. Bettenhausen “Microwave Scattering Measurement from a Laser Produced Plasma Sheet”, American Physics Society, Division of Plasma Physics Meeting, Pittsburgh, (1997), bMoaP1.22.
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G. Ding, J. Scharer and K. Kelly, “Fast Langmuir probe measurements in a laser produced plasma,” Gaseous Electronics Conference, Madison, (1997), OWP4.
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J. Scharer, M. Bettenhausen, G. Ding, et al., “Laser and Radiofrequency Air Plasma Sources”, IEEE International Conference on Plasma Science, (1998), page 302.
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K. Kelly, J. Scharer, G. Ding, et al. “Microwave Reflection from a VUV Laser Produced Plasma sheet,” IEEE International Conference on Plasma Science, (1997), page 134.
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G. Ding, J. Scharer and K. Kelly, “Laser produced TMAE plasma in Nitrogen, Oxygen and Air,” IEEE International Conference on Plasma Science, (1998), page 274.
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K. Kelly, J. Scharer and G. Ding, “Microwave Reflection from a VUV Laser Produced Plasma sheet”, IEEE International Conference on Plasma Science, (1998), page 275.
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J. Scharer, M. Bettenhausen, G. Ding, et al., “Laser and Radiofrequency Tailored Gas Plasma Sources,” IEEE International Conference on Plasma Science, (1998), page 240.
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J. Scharer, G. Ding, H. Gui, et al., “Laser and Radiofrequency Air Plasma Sources”, American Physics Society, Division of Plasma Physics Meeting, New Orleans, (1998), J5P.08.
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G. Ding, J. Scharer and K. Kelly, “Nitrogen Influences on a Laser Produced TMAE Plasma”, IEEE International Conference on Plasma Science, Monterey, (1999), 4P03.
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K. Kelly, J. Scharer, G. Ding, “A Laser-Produced Plasma Sustained by a Radiofrequency Source”, IEEE International Conference on Plasma Science, Monterey, (1999). 4P04.
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J. Scharer, G. Ding, X. Guo et al. “Laser and Radio-frequency wave Creation of Seeded Air Plasmas”, IEEE International Conference on Plasma Science, Monterey, (1999). 2B06.
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K. Kelly, J. Scharer, G. Ding, et al. “Radio-frequency Sustainment of a Laser-Produced Plasma”, IEEE International Conference on Plasma Science, Monterey, (1999). 2B05.
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G. Ding, J. Scharer and K. Kelly, “Properties of Laser Produced TMAE Plasma Admixed with Air Constitutes, Nitrogen and Noble Gases.” Gaseous Electronics Conference, Norfolk, Bulletin of The American Physical Society, Vol. 44(4), page 48, (1999)
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J. Scharer, G. Ding, H. Gui, K. Kelly and E. Paller, “Laser and Radiofrequency Production of Seeded air Plasmas”, Gaseous Electronics Conference, Norfolk, Bulletin of The American Physical Society, Vol. 44(4), page74, (1999)
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G. Ding, J. E. Scharer, R. Cao, K. L. Kelly, “Diagnostic and analyses of a laser-produced organic vapor plasma”, IEEE International Conference on Plasma Science, Piscataway, (2000), P112.
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K.L.Kelly, J.E.;Scharer, G. Ding, E. Paller and R. Cao, “Laser-produced plasma sustained by a radiofrequency sour”, IEEE International Conference on Plasma Science, Piscataway, (2000), P113.
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E.S. Paller,, J.E. Scharer,; K.L Kelly,.and G. Ding, “Argon and air mixture plasmas produced by a radiofrequency plasma source”, IEEE International Conference on Plasma Science, Piscataway, (2000), P113.
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G. Ding, S.E. Babayan, G. Nowling, and R.F. Hicks, “Characterization of the Reactive Species in an Atmospheric-Pressure Nitrogen Plasma”, American Vacuum Society Symposium, Boston, 2000, TF-TuP38
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K. Kelly, J. Scharer, R. Cao, G. Ding, E. Paller “Laser Initiation and Radiofrequency Sustainment of Seeded Air Plasmas”, 42nd Annual Meeting of the APS (American Physics Society) Division of Plasma Physics combined with the 10th International Congress on Plasma Physics, October 23 - 27, 2000, Québec City, Canada, GP1.003.
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G. Ding, S.E. Babayan, G. Nowling, and R.F. Hicks, “Determination of the Reactive Species in an Atmospheric-Pressure Nitrogen Plasma” , American Institute of Chemical Engineers Annual Meeting, November 12-17, 2000, Los Angeles, 210g
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Guowen Ding, Benjamin Schwarz, Changhun Lee, “Extension of Aluminum etch using a carbon mask for high aspect ratio 70nm Al etch with a chlorine based chemistry.”, AVS 56th international Symposium, 2016, Nov 10-12, San Jose, CA.
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G. Ding, Y. Wang, J. Cheng, D. Schweigert, Z. Sun, M. Le, “Quick Estimation of Deposition Rate for a Sputter System”, AVS 59th Annual International Symposium and Exhibition, PS-ThP10, Tampa, FL, October 28-November 2, 2012
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G. DING, M. LE, F. HASSAN, Z. SUN, M. NGUGEN , “Ellipsometry Study of a Reactively Sputtered Transparent Conductive Oxide(TCO), 39th ICMCTF (NTERNATIONAL CONFERENCE ON METALLURGICAL COATINGS & THIN FILMS), April 23–27, 2012, San Diego, California, USA
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G. Ding, Y. Wang, Z. Sun, and M. Le, "Thin Silver Refractive Index Calculation from Ellipsometry and Resistivity," in Optical Interference Coatings, M. Tilsch and D. Ristau, eds., OSA Technical Digest (online) (Optical Society of America, 2013), paper ThC.5.
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Minh Le, Guowen Ding, Daniel Schweigert, Yong Li, Yiwei Lu, Philip Lingle & Muhammad Imran, “Combinatorial Optimization of Nanoscale Film Stacks for Low-E Glass Coatings” GPD Glass Performance Days Finland 2013 - Conference Proceedings 13-15 June, Tampere, Finland
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Guowen Ding, “High Productivity Combinatorial (HPC™) Platforms to Accelerate R&D on Glass Coating”, The 25th China International Glass Industrial Technical Exhibition (China Glass 2014), Shanghai, China.
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Guowen Ding and Minh Le, “Review of Low emissivity (low-E) coating technologies for Energy saving window applications”, 36th, NCCAVS - Symposia & Exhibitions, san Jose, CA , Feb. 2015
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Guowen Ding, César Clavero, Daniel Schweigert, “A new Constant of product of electronic scattering time and resistivity in Thin Silver Refractive Index Calculation from Ellipsometry and Resistivity measurements” AVS 63rd international Symposium, 2016, Nov 6-11, Nashvile, TN
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Guowen Ding, “High throughput experimentation (HTE) Platforms to Accelerate R&D on Glass Coating”, 2017 Chinese Glass Industry Annual Conference, HangZhou, China, April, 2017
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Xiyue Zhou, Yucen Liu and Guowen Ding, “A New Conductive Material for Energy Efficient Window Applications” 14th International Conference and Exhibition on Materials Science and Engineering, November 13-15, 2017, Las Vegas, Nevada, USA
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Guowen Ding and Thomas Lu，“ Simulations and experiments on Ag-Ti alloy optical properties and its window coating application” 8th International Conference and Exhibition on Lasers, Optics & Photonics， Nov 15-17, 2017 Las Vegas, Nevada, USA
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Guowen Ding, “A new materials innovation methodology in thin film optical coating applications”, 39th, NCCAVS - Symposia & Exhibitions, san Jose, CA , Feb. 2018
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Daniel Lin, Tevin Ding, and Guowen Ding， “Can Thin Film Alloy Refractive Index Be Accurately predicted?---Theoretical & Experimental Study Thin Film Alloy AgZn Refractive Index” 48th International Conference on Metallurgical Coatings and Thin Films (ICMCTF 2022) in San Diego, California, May. 2022, USA
PATENTS PUBLICATIONS:
patent/publications # Title
1 7,320,942
Method for removal of metallic residue after plasma etching of a metal layer
2 8,101,025
Method for controlling corrosion of a substrate
3 8,298,849
Nitrogen reactive sputtering of Cu-In-Ga-N for solar cells
4 8,394,659
Nitrogen reactive sputtering of Cu-In-Ga-N for solar cells
5 8,435,419
Methods of processing substrates having metal materials
6 8,557,615
TCO materials for solar applications
7 8,665,511
Electrochromic device with improved transparent conductor and method for forming the same
8 8,747,626
Method of generating high purity bismuth oxide
9 8,778,514
Heat stable SnAl and SnMg based dielectrics
10 8,784,934
Heat stable SnAl and SnMg based dielectrics
11 8,900,423
Low refractive index material by sputtering deposition method
12 9,011,969
Low-E panel with improved dielectric layer and method for forming the same
13 9,013,782
Low-emissivity panels including magnetic layers
14 9,019,483
Method to extend single wavelength ellipsometer to obtain spectra of refractive index
15 9,045,363
Low-E panels with ternary metal oxide dielectric layer and method for forming the same
16 9,052,456
Low-E glazing performance by seed structure optimization
17 9,081,245
Electrochromic device with improved transparent conductor and method for forming the same
18 9,121,100
Silver based conductive layer for flexible electronics
19 9,127,348
Barrier layers for silver reflective coatings and HPC workflows for rapid screening of materials for such barrier layers
20 9,206,078
Barrier layers for silver reflective coatings and HPC workflows for rapid screening of materials for such barrier layers
21 9,279,910
Color shift of high LSG low emissivity coating after heat treatment
22 9,296,650
Low-E panels and methods for forming the same
23 9,296,651
Heat stable SnAl and SnMg based dielectrics
24 9,297,938
Methods and apparatuses for patterned low emissivity panels
25 9,309,149
Systems, methods, and apparatus for production coatings of low-emissivity glass
26 9,315,414
Low-e panels with ternary metal oxide dielectric layer and method for forming the same
27 9,321,676
Low-E glazing performance by seed structure optimization
28 9,365,450
Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
29 9,394,198
Simplified protection layer for abrasion resistant glass coatings and methods for forming the same
30 9,405,046
High solar gain low-e panel and method for forming the same
31 9,408,303
Silver based conductive layer for flexible electronics
32 9,410,359
Low-e panels and methods for forming the same
33 9,416,049
Low-e panels and methods for forming the same
34 9,448,345
Silver barrier materials for low-emissivity applications
35 9,481,924
Seed layer for low-e applications
36 9,499,899
Systems, methods, and apparatus for production coatings of low-emissivity glass including a ternary alloy
37 9,518,319
Low-emissivity glass including spacer layers compatible with heat treatment
38 20030219912
Method for removal of metallic residue after plasma etching of a metal layer
39 20040237997
Method for removal of residue from a substrate
40 20060137710
Method for controlling corrosion of a substrate
41 20090163033
METHODS FOR EXTENDING CHAMBER COMPONENT LIFE TIME
42 20100003828
METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS WITH A HIGHLY CONCENTRATED UNSATURATED HYDROCARBON GAS
43 20110303639
METHODS FOR PROCESSING SUBSTRATES HAVING METAL HARD MASKS
44 20110306215
METHODS OF PROCESSING SUBSTRATES HAVING METAL MATERIALS
45 20120094499
METHOD OF PERFORMING AN IN SITU CHAMBER CLEAN
46 20130122643
Nitrogen Reactive Sputtering of Cu-In-Ga-N for Solar Cells
47 20130136851
METHOD OF FORMING ATO WITH HIGH THROUGHPUT AND ELLIPSOMETRY DIAGNOSTIC METHOD FOR THE TCO PROCESS
48 20130136919
METHOD OF GENERATING HIGH PURITY BISMUTH OXIDE
49 20130136921
METHOD OF GENERATING HIGH PURITY BISMUTH OXIDE
50 20130136932
Heat Stable SnAl and SnMg Based Dielectrics
51 20130143354
TCO MATERIALS FOR SOLAR APPLICATIONS
52 20130163064
Electrochromic Device With Improved Transparent Conductor And Method For Forming The Same
53 20130164560
Low-E Panel With Improved Dielectric Layer And Method For Forming The Same
54 20130164561
Low-E Panels With Ternary Metal Oxide Dielectric Layer And Method For Forming The Same
55 20130189526
Heat Stable SnAl and SnMg Based Dielectrics
56 20130319847
METHODS AND APPARATUSES FOR LOW RESISTIVITY Ag THIN FILM USING COLLIMATED SPUTTERING
57 20140048013
SEED LAYER FOR ZnO AND DOPED-ZnO THIN FILM NUCLEATION AND METHODS OF SEED LAYER DEPOSITION
58 20140092462
Electrochromic Device with Improved Transparent Conductor and Method for Forming the Same
59 20140166472
Method and apparatus for temperature control to improve low emissivity coatings
60 20140168759
Methods and apparatuses for patterned low emissivity panels
61 20140170049
Low Refractive Index Material By Sputtering Deposition Method
62 20140170338
pvd chamber and process for over-coating layer to improve emissivity for low emissivity coating
63 20140170413
Silver Based Conductive Layer For Flexible Electronics
64 20140170421
Low-E Panel with Improved Barrier Layer and Method for Forming the Same
65 20140170422
Low emissivity coating with optimal base layer material and layer stack
66 20140170434
Two Layer Ag Process For Low Emissivity Coatings
67 20140177042
Novel silver barrier materials for low-emissivity applications
68 20140178578
Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers
69 20140185034
Method to Extend Single Wavelength Ellipsometer to Obtain Spectra of Refractive Index
70 20140186598
Base-layer consisting of two materials layer with extreme high/low index in low-e coating to improve the neutral color and transmittance performance
71 20140268301
LOW-EMISSIVITY PANELS INCLUDING MAGNETIC LAYERS
72 20140268316
SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY
73 20140268317
High Solar Gain Low-E Panel and Method for Forming the Same
74 20140272335
Low-E Glazing Performance by Seed Structure Optimization
75 20140272353
Color shift of high LSG low emissivity coating after heat treatment
76 20140272354
Method to generate high LSG low-emissivity coating with same color after heat treatment
77 20140272390
Low-E Panel with Improved Barrier Layer Process Window and Method for Forming the Same
78 20140272395
LOW-EMISSIVITY GLASS INCLUDING SPACER LAYERS COMPATIBLE WITH HEAT TREATMENT
79 20140272454
Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers
80 20140272455
Titanium nickel niobium alloy barrier for low-emissivity coatings
81 20140287254
Heat Stable SnAl and SnMg Based Dielectrics
82 20140308528
SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS
83 20140322507
SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS
84 20150060910
Conductive Transparent Reflector
85 20150104569
Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers
86 20150158762
Simplified Protection Layer for Abrasion Resistant Glass Coatings and Methods for Forming the Same
87 20150162111
Transparent Conductive Films and Methods for Forming the Same
88 20150177583
SYSTEMS, METHODS, AND APPARATUS FOR INTEGRATED GLASS UNITS HAVING ADJUSTABLE SOLAR HEAT GAINS
89 20150177585
Systems, Methods, and Apparatus for Integrated Glass Units Having Adjustable Transmissivities
90 20150191815
Titanium nickel niobium alloy barrier for low-emissivity coatings
91 20150191965
Low-E Panels and Methods for Forming the Same
92 20150232376
Low-E Glazing Performance by Seed Structure Optimization
93 20150232378
Low-E Panels With Ternary Metal Oxide Dielectric Layer and Method For Forming The Same
94 20150327366
Silver Based Conductive Layer for Flexible Electronics
95 20150337432
Barrier Layers for Silver Reflective Coatings and HPC Workflows for Rapid Screening of Materials for Such Barrier Layers
96 20150345005
Seed layer for low-e applications
97 20150368152
Low-E Panels and Methods for Forming the Same
98 20160102013
Low-E Panels and Methods for Forming the Same
99 20160122235
Low-E Panels and Methods of Forming the Same
100 20170052297
SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS INCLUDING A TERNARY ALLOY
101 WO2016149239 (A1)
TITANIUM NICKEL NIOBIUM ALLOY BARRIER FOR LOW-EMISSIVITY COATINGS
102 WO2015200050 (A1)
LOW-E PANELS AND METHODS FOR FORMING THE SAME
103 WO2014165202 (A1)
NEW DESIGN FOR IMPROVING COLOR SHIFT OF HIGH LSG LOW EMISSIVITY COATING AFTER HEAT TREATMENT
104 WO 2014164996 A1
Improved low-e glazing performance by seed-structure optimization
105 WO2014164989 (A1)
PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS SYSTEMS
106 WO2014164983 (A1)
AN IMPROVED CONDUCTIVE TRANSPARENT REFLECTOR
107 WO2014164978 (A1)
TITANIUM NICKEL NIOBIUM ALLOY BARRIER FOR LOW-EMISSIVITY COATINGS
108 WO 2014160414 A1
Low-emissivity glass including spacer dielectric layers compatible with heat treatment
109 WO 2014160357 A1
Color shift improvement after heat treatment
110 WO2014159699A1
Barrier layers for silver reflective coatings and hpc workflows for rapid screening of materials for such barrier layers
111 WO 2014159670 A1
SYSTEMS, METHODS, AND APPARATUS FOR PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS
112 WO2014159653 (A1)
IMPROVED HIGH SOLAR GAIN LOW-E PANEL AND METHOD FOR FORMING THE SAME
113 WO 2014159640 A1
METHOD TO GENERATE HIGH LSG LOW-EMISSIVITY COATING WITH SAME COLOR AFTER HEAT TREATMENT
114 WO 2014159553 A1
TERNARY ALLOY PRODUCTION COATINGS OF LOW-EMISSIVITY GLASS
115 WO 2014159429 A1
LOW-EMISSIVITY TEMPERED GLASS INCLUDING SPACER LAYER
116 WO2014151446 (A3)
LOW-E PANEL WITH IMPROVED BARRIER LAYER PROCESS WINDOW AND METHOD FOR FORMING THE SAME
117 WO2014093779 (A1)
IMPROVED LOW EMISSIVITY COATING WITH OPTIMAL BASE LAYER MATERIAL AND LAYER STACK
118 WO 2014093766 A1
IMPROVED SILVER BASED CONDUCTIVE LAYER FOR FLEXIBLE ELECTRONICS
119 WO 2014028283 A3
SEED LAYER FOR ZnO AND DOPED-ZnO THIN FILM NUCLEATION AND METHODS OF SEED LAYER DEPOSITION
120 WO 2013101338 A1
LOW-E PANELS WITH TERNARY METAL OXIDE DIELECTRIC LAYER AND METHOD FOR FORMING THE SAME
121 JP2009135498 (A)
METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS
122 CN101030531 (A)
Method for controlling corrosion of a substrate
123 CN101452881 (A)
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124 CN104995149 (A
IMPROVED LOW EMISSIVITY COATING WITH OPTIMAL BASE LAYER MATERIAL AND LAYER STACK
125 CN105431392 (A)
Electrically insulating material for thermal sprayed coatings
126 CN1574203 (A)
Method for removal of residue from a substrate
127 EP2065923 (A3)
METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS
128 KR101046818 (B1)
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129 KR20040102337 (A)
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130 KR20070089082 (A)
Method for controlling corrosion of a substrate
131 KR20150141928 (A)
IMPROVED LOW EMISSIVITY COATING WITH OPTIMAL BASE LAYER MATERIAL AND LAYER STACK
132 RU2015143190 (A)
Titanium nickel niobium alloy barrier for low-emissivity coatings
133 SG153011 (A1)
METHODS FOR ADJUSTING CRITICAL DIMENSION UNIFORMITY IN AN ETCH PROCESS
134 TW200501255 (A)
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135 TW200739716 (A)
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136 TW200947560 (A)
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